Pulse Power Supply
Pulse Power Supply with Peak Currents the amount of :
(0 to 100 mA) (0 to 150 mA) (0 to 200 mA) (0 to 250 mA)
• Pulse Power supply based on voltage control
• Pulse Power supply based on current control
• Pulse Power supply based on power control (As requested)
• Pulse Power supply based on Z control (As requested)
•Pulse Power supply based on frequency control (bipolar and unipolar)
• Pulse Power supply based on duty cycle control (bipolar and unipolar)
• Pulse Power supply based on bi-polar asymmetric pulse level control (bipolar)
Controls manually or programmed with the ability to save and retrieve programs for process surface deposition in the following models:
Product Group # 1:Pulse Power Supply for Single-cathode sputtering system under the Visual Studio (V) platform or Rad Studios with four Maximum Peak Current
(GPU100V) (GPU150V) (GPU200V) (GPU250V)
(GPB100V) (GPB150V) (GPB200V) (GPB250V)
Product Group # 2: Network(R) Pulse Power Supply for Single-cathode sputtering system under the Visual Studio (V) platform or Rad Studios with four Maximum Peak Current
(GPU100VR) (GPU150VR) (GPU200VR) (GPU250VR)
(GPB100VR) (GPB150VR) (GPB200VR) (GPB250VR)
Product Group # 3: Pulse Power Supply for Single-cathode sputtering system under the HMI (H) platform with four Maximum Peak Current
(GPU100H) (GPU150H) (GPU200H) (GPU250H)
(GPB100H) (GPB150H) (GPB200H) (GPB250H)
Product Group # 4: Network(R) Pulse Power Supply for Single-cathode sputtering system under HMI (H) platform with four Maximum Peak Current
(GPU100HR) (GPU150HR) (GPU200HR) (GPU250HR)
(GPB100HR) (GPB150HR) (GPB200HR) (GPB250HR)
The software is designed and delivered according to the order of the user.
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